Belgian research hub imec received ASML’s EXE:5200 High-NA EUV lithography system. The advanced equipment costs approximately $400 million. This system enables development for sub-2-nanometer logic and high-density memory chips.
Imec’s global partners gain early access to this next-generation manufacturing technology. The European Union and several national governments supported the acquisition to strengthen regional R&D leadership. Imec expects the High-NA system to reach full qualification by the fourth quarter of 2026. ASML anticipates customers will transition to high-volume manufacturing between 2027 and 2028.