ASML CEO Christophe Fouquet announced that the first products from new High-NA EUV lithography machines will arrive within months. Fouquet shared the update during an industry conference in Belgium.
These next-generation systems reduce patterning costs for advanced logic and memory chips. Each High-NA machine costs approximately $400 million.
The technology is essential for manufacturing next-generation semiconductors used in AI applications. Major customers including TSMC previously expressed hesitation regarding the high price of the systems.