ASML achieved a technological breakthrough by increasing the light source power in its extreme ultraviolet (EUV) lithography systems.
Researchers successfully raised the machine's power from 600 watts to 1,000 watts. This enhancement is expected to increase chip production by 50% by the end of the decade.
The upgrade allows customers to process 330 silicon wafers per hour, up from the current rate of 220 wafers. ASML confirmed the system is stable and ready for customer environments rather than a temporary demonstration.