Intel successfully installed and validated ASML's first commercial High-NA EUV (extreme ultraviolet) lithography machine. The TWINSCAN EXE:5200B is now ready to transition from research and development to high-volume production.
The new scanner increases wafer output to 175 per hour compared to previous models and offers higher resolution. This capability is crucial to Intel’s strategy to reclaim leadership in chip manufacturing.
This critical step enables the fabrication of smaller, more powerful transistors for future process nodes. It is central to Intel's planned 14A node and solidifies the strategic partnership between the two companies.
Available reports noted no specific market reaction to this announcement.