ASML and Intel confirmed the successful installation and acceptance testing of the industry’s first commercial High-NA EUV lithography system. The machine, designated the TWINSCAN EXE:5200B, is now operational at an Intel research and development facility in Oregon.
Intel will use the system to develop next-generation chip manufacturing processes, potentially starting with the 14A node. The advanced TWINSCAN EXE:5200B maintains the high resolution of the first-generation research tool. Crucially, it increases productivity to 175 wafers per hour.
The deployment marks a significant step for the entire semiconductor industry. It enables the fabrication of smaller, more powerful transistors and paves the way for future technological advancements. No specific market reaction to the announcement was immediately available.