China Chip Leaders Push for National Lithography Breakthrough to Rival ASML by 2030

Chairmen from Naura Technology Group and Yangtze Memory Technologies Corp. have issued a public call for a coordinated national effort to develop domestic lithography systems.

The initiative aims to establish a domestic equivalent to ASML between 2026 and 2030. This timeline underscores Beijing’s push for technological self-reliance amid ongoing international export controls.

The proposal emphasizes the strategic necessity of building indigenous manufacturing capabilities to reduce dependence on foreign suppliers. ASML currently maintains a global monopoly on the Extreme Ultraviolet (EUV) lithography machines required for advanced chip production.

This development signals a significant long-term competitive threat to ASML in one of its primary markets.