Bipartisan U.S. lawmakers introduced the MATCH Act to tighten export controls on semiconductor manufacturing equipment sold to China. The bill specifically targets deep ultraviolet (DUV) lithography systems. This legislation aims to close existing loopholes in technology restrictions.
The act seeks to align U.S. regulations with those of the Netherlands and Japan, home to ASML and Tokyo Electron. This alignment creates a level playing field for American firms like Applied Materials, Lam Research, and KLA Corp. It also restricts the servicing of existing equipment already located in China.
Specific targets include Chinese firms SMIC and Huawei. The bill intends to curb Beijing’s progress in artificial intelligence and military technology.