ASML is doubling down on its laser-produced plasma (LPP) technology for extreme ultraviolet (EUV) lithography. The company rejected an alternative free-electron laser (FEL) method favored by Elon Musk.
ASML plans to advance its LPP systems to reach 1,000W source power in the coming years.
A JPMorgan note indicates ASML views the particle accelerator-based FEL approach as too complex and costly. The company will instead leverage the steady progress and future potential of its established light sources.