Intel has transitioned ASML’s next-generation High-NA EUV lithography machine from research to limited production. The tool is currently manufacturing specific layers for Intel’s flagship Panther Lake laptop chips at its Oregon facility.
Each High-NA EUV machine costs approximately $400 million. This technology enables the printing of smaller, more complex circuit patterns required for future chip generations.
Intel is integrating the equipment into its 18A process node to optimize production data. The move signals a strategic commitment to reclaiming the company's leadership in semiconductor manufacturing.