Intel is the first chipmaker to use ASML’s next-generation High-NA extreme ultraviolet (EUV) lithography machine for high-volume production. This advanced tool costs approximately $400 million. Intel uses the equipment to manufacture specific layers of its flagship Panther Lake Core Ultra Series 3 laptop chips.
The company deployed the technology on its 18A process node at its Oregon facility. High-NA EUV systems print smaller and more precise circuit patterns to create more powerful processors.
Intel’s move integrates the technology into commercial production despite industry debates over economic timing. The initiative involves a close collaboration with ASML to gather production data. This partnership aims to optimize the equipment for broader future applications.